Share Email Print
cover

Proceedings Paper

Reticle variation influence on manufacturing line and wafer device performance
Author(s): John L. Nistler; Kyle Spurlock
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Cost effective manufacturing of devices at 0.5, 0.35 and 0.25μm geometries will be highly dependent on a companys’ ability to obtain an economic return on investment. The high capital investment in equipment and facilities, not to mention the related chemical and wafer costs, for producing 200mm silicon wafers requires aspects of wafer processing to be tightly controlled. Reduction in errors and enhanced yield management requires early correction or avoidance of reticle problems. It is becoming increasingly important to recognize and track all pertinent factors impacting both the technical and financial viability of a wafer manufacturing fabrication area. Reticle related effects on wafer manufacturing can be costly and affect the total quality perceived by the device customer.

Paper Details

Date Published: 1 January 1994
PDF: 36 pages
Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027308 (1 January 1994); doi: 10.1117/12.177440
Show Author Affiliations
John L. Nistler, Advanced Micro Devices, Inc. (United States)
Kyle Spurlock, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 10273:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Gregory K. Hearn, Editor(s)

© SPIE. Terms of Use
Back to Top