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Proceedings Paper

Mask quality assurance from a user's perspective
Author(s): Terry W. Russell
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Paper Abstract

As the industry continues to move toward production in the 64- and 256-MB technology regime, the challenges posed by more stringent requirements associated with wafer lithography and reticle manufacturing are driving developments which may be out-pacing the ability of the industry to guarantee reticle performance.

Paper Details

Date Published: 1 January 1994
PDF: 10 pages
Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730E (1 January 1994); doi: 10.1117/12.177434
Show Author Affiliations
Terry W. Russell, DuPont Photomasks, Inc. (Taiwan)


Published in SPIE Proceedings Vol. 10273:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Gregory K. Hearn, Editor(s)

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