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Proceedings Paper

Reticle defect detection and repair
Author(s): Rajeev R. Singh
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Paper Abstract

Reticles used in semiconductor lithography processes are required to be defect free. The meaning of the term "defect free" has evolved. This paper will provide a discussion on the evolution of this term and the defect inspection and repair equipment requirements for masks and reticles. A summary of current mask and reticle inspection and repair tools will also be provided.

Paper Details

Date Published: 1 January 1994
PDF: 12 pages
Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730C (1 January 1994); doi: 10.1117/12.177432
Show Author Affiliations
Rajeev R. Singh, SEMATECH (United States)


Published in SPIE Proceedings Vol. 10273:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Gregory K. Hearn, Editor(s)

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