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Proceedings Paper

Lithography Roadmap: the role of the mask-making industry
Author(s): Gordon B. McMillan
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Paper Abstract

This paper sets a framework for those which follow. Specifically, the requirements of lithography and masks are detailed over a 15 year period and the exposure tool roadmap is reviewed. The various business stages in developing a lithography system, from concept to market success, are discussed and the need for earlier involvement of the mask making industry is identified.

Paper Details

Date Published: 1 January 1994
PDF: 8 pages
Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027302 (1 January 1994); doi: 10.1117/12.177430
Show Author Affiliations
Gordon B. McMillan, SEMATECH (United States)


Published in SPIE Proceedings Vol. 10273:
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Gregory K. Hearn, Editor(s)

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