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Proceedings Paper

Binary optics for optical interconnects
Author(s): Steven M. Shank; Harold G. Craighead
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Paper Abstract

Four- and eight-level diffractive optical elements (DOES) are fabricated in silicon using electron beam lithography and reactive ion etching. An f/1.9. 1-mm diameter, four-phase level, reflective off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first-order efficiency of the DOE is 73%. Eight-level linear gratings are fabricated to determine processing tolerances for DOEs with first order-diffraction efficiencies greater than 90%.

Paper Details

Date Published: 3 June 1994
PDF: 9 pages
Proc. SPIE 2216, Photonics at the Air Force Photonics Center, (3 June 1994); doi: 10.1117/12.177332
Show Author Affiliations
Steven M. Shank, Cornell Univ. (United States)
Harold G. Craighead, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 2216:
Photonics at the Air Force Photonics Center
Andrew R. Pirich; Paul Sierak, Editor(s)

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