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Proceedings Paper

Amplified spontaneous emission simulation of copper bromide vapor laser
Author(s): Naohiko Goto; Koshichi Nemoto
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Paper Abstract

The excited copper vapor distribution within the discharge tube was determined by simulating ASE intensity distribution--obtained with the copper bromide vapor laser equipment--using ASE intensity distribution simulation code. Upper and lower level population of copper vapor were assumed to have a uniform distribution along the tube axis and a Gaussian distribution along the tube radius in this simulation code. The simulation has revealed that distributions concentrate to the center of discharging and the difference of populations between the upper and lower levels little depend on reservoir temperature.

Paper Details

Date Published: 25 May 1994
PDF: 10 pages
Proc. SPIE 2118, Gas, Metal Vapor, and Free-Electron Lasers and Applications, (25 May 1994); doi: 10.1117/12.176675
Show Author Affiliations
Naohiko Goto, Central Research Institute of Electric Power Industry (Japan)
Koshichi Nemoto, Central Research Institute of Electric Power Industry (Japan)


Published in SPIE Proceedings Vol. 2118:
Gas, Metal Vapor, and Free-Electron Lasers and Applications
Vern N. Smiley; Frank K. Tittel, Editor(s)

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