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Proceedings Paper

Recent progress of the Los Alamos advanced free-electron laser
Author(s): Dinh C. Nguyen; R. H. Austin; Kwok-Chi D. Chan; Donald W. Feldman; John C. Goldstein; S. M. Gierman; John M. Kinross-Wright; S. H. Kong; J. G. Plato; S. J. Russell; Richard L. Sheffield; B. A. Sherwood; F. E. Sigler; C. A. Timmer; Michael E. Weber; C. Ziomek
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Paper Abstract

The Los Alamos advanced FEL has been built specifically for industrial and research applications. Advanced technologies such as a high-brightness photoinjector, a high-gradient compact linac, and permanent magnet components reduce the Advanced FEL size and yet maintain its high-average-power capability. The Advanced FEL has been in operation in the near IR since (4 to 6 micrometers since early 1993. Recent results of the Advanced FEL lasing characteristics and high-average-power upgrades are presented.

Paper Details

Date Published: 25 May 1994
PDF: 18 pages
Proc. SPIE 2118, Gas, Metal Vapor, and Free-Electron Lasers and Applications, (25 May 1994); doi: 10.1117/12.176659
Show Author Affiliations
Dinh C. Nguyen, Los Alamos National Lab. (United States)
R. H. Austin, Los Alamos National Lab. (United States)
Kwok-Chi D. Chan, Los Alamos National Lab. (United States)
Donald W. Feldman, Los Alamos National Lab. (United States)
John C. Goldstein, Los Alamos National Lab. (United States)
S. M. Gierman, Los Alamos National Lab. (United States)
John M. Kinross-Wright, Los Alamos National Lab. (United States)
S. H. Kong, Los Alamos National Lab. (United States)
J. G. Plato, Los Alamos National Lab. (United States)
S. J. Russell, Los Alamos National Lab. (United States)
Richard L. Sheffield, Los Alamos National Lab. (United States)
B. A. Sherwood, Los Alamos National Lab. (United States)
F. E. Sigler, Los Alamos National Lab. (United States)
C. A. Timmer, Los Alamos National Lab. (United States)
Michael E. Weber, Los Alamos National Lab. (United States)
C. Ziomek, Los Alamos National Lab. (United States)


Published in SPIE Proceedings Vol. 2118:
Gas, Metal Vapor, and Free-Electron Lasers and Applications
Vern N. Smiley; Frank K. Tittel, Editor(s)

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