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Proceedings Paper

Development of a laboratory extreme-ultraviolet lithography tool
Author(s): Daniel A. Tichenor; Glenn D. Kubiak; Michael E. Malinowski; Richard H. Stulen; Steven J. Haney; Kurt W. Berger; Rodney P. Nissen; G. A. Wilkerson; Phillip H. Paul; S. R. Birtola; P. S. Jin; Richard William Arling; Avijit K. Ray-Chaudhuri; William C. Sweatt; Weng W. Chow; John E. Bjorkholm; Richard R. Freeman; Marc D. Himel; Alastair A. MacDowell; Donald M. Tennant; Linus A. Fetter; Obert R. Wood; Warren K. Waskiewicz; Donald L. White; David L. Windt; Tanya E. Jewell
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Paper Abstract

The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzschild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requirements. High-resolution, 10x-reduction images of a reflection mask are shown.

Paper Details

Date Published: 13 May 1994
PDF: 11 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175834
Show Author Affiliations
Daniel A. Tichenor, Sandia National Labs. (United States)
Glenn D. Kubiak, Sandia National Labs. (United States)
Michael E. Malinowski, Sandia National Labs. (United States)
Richard H. Stulen, Sandia National Labs. (United States)
Steven J. Haney, Sandia National Labs. (United States)
Kurt W. Berger, Sandia National Labs. (United States)
Rodney P. Nissen, Sandia National Labs. (United States)
G. A. Wilkerson, Sandia National Labs. (United States)
Phillip H. Paul, Sandia National Labs. (United States)
S. R. Birtola, Sandia National Labs. (United States)
P. S. Jin, Sandia National Labs. (United States)
Richard William Arling, Sandia National Labs. (United States)
Avijit K. Ray-Chaudhuri, Sandia National Labs. (United States)
William C. Sweatt, Sandia National Labs. (United States)
Weng W. Chow, Sandia National Labs. (United States)
John E. Bjorkholm, AT&T Bell Labs. (United States)
Richard R. Freeman, AT&T Bell Labs. (United States)
Marc D. Himel, AT&T Bell Labs. (United States)
Alastair A. MacDowell, AT&T Bell Labs. (United States)
Donald M. Tennant, AT&T Bell Labs. (United States)
Linus A. Fetter, AT&T Bell Labs. (United States)
Obert R. Wood, AT&T Bell Labs. (United States)
Warren K. Waskiewicz, AT&T Bell Labs. (United States)
Donald L. White, AT&T Bell Labs. (United States)
David L. Windt, AT&T Bell Labs. (United States)
Tanya E. Jewell, Optical Engineering Consultant (United States)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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