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Proceedings Paper

Direct inclusion of the proximity effect in the calculation of kinoforms
Author(s): Jorgen Bengtsson
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Paper Abstract

Knowledge of the effects of fabrication using microlithography is essential when trying to reach a desired structure, i.e., when using proximity effect compensation. In this presentation, the particular case of diffractive microlenses, kinoforms, is studied. Normally, compensation for the proximity effect is done after the kinoform structure has been calculated with optical design methods. However, in this presentation it is shown that including the proximity effect already in the optical design methods leads to kinoforms whose optical quality is greatly improved.

Paper Details

Date Published: 13 May 1994
PDF: 5 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175819
Show Author Affiliations
Jorgen Bengtsson, Chalmers Univ. of Technology (Sweden)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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