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Proceedings Paper

Very simple data processing system for deep submicron nanofabrication
Author(s): Shyi-Long Shy; Tan Fu Lei; C. H. Chu; Chun-Yen Chang; Sia Hau Lee; Wen-An Loong
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Paper Abstract

In this paper, a very simple data processing system for deep submicron nanofabrication was developed on a popular 80486 based personal computer using commercially available softwares: AutoCAD and ASM3500. Each personal computer can communicate with the control computer (Micro Vax 3900) in the JBX-5DII electron-beam system using the Telnet and FTP software. Deep submicron patterning on wafer and chromium photomask were done using well established electron-beam direct write technology and evaluated using AFM and SEM. Although most electron-beam systems supply text editing program, it is hard to use even for compact pattern data and cannot inspect the overlaying of the patterns. This system can be of great cost-effective value in researching applications for nanofabrication too.

Paper Details

Date Published: 13 May 1994
PDF: 9 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175815
Show Author Affiliations
Shyi-Long Shy, National Nano Device Lab. (Taiwan)
Tan Fu Lei, National Nano Device Lab. (Taiwan)
C. H. Chu, National Nano Device Lab. (Taiwan)
Chun-Yen Chang, National Nano Device Lab. (Taiwan)
Sia Hau Lee, National Chiao Tung Univ. (Taiwan)
Wen-An Loong, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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