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Proceedings Paper

Techniques for determination of the absorbed energy density function in electron-beam lithography
Author(s): Sergey V. Babin
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Paper Abstract

An experimental technique for measurement of the absorbed energy density distribution from the center of an electron beam is presented. The test structure and the way of determining critical exposure doses are constructed in such a way that the resist development process has no influence on the experimental results. Questions of `technological' and `physical' proximity functions usage are considered. The absorbed energy density function measurements were carried out for a number of accelerating voltages. The dependence of these function parameters on the electron's energy was determined.

Paper Details

Date Published: 13 May 1994
PDF: 6 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175814
Show Author Affiliations
Sergey V. Babin, Physics and Technology Institute (Russia)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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