Share Email Print

Proceedings Paper

Miniature electron microscopes for lithography
Author(s): Alan D. Feinerman; David A. Crewe; Dung-Ching Perng; Capp A. Spindt; Paul R. Schwoebel; Albert V. Crewe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Two inexpensive and extremely accurate methods for fabricating miniature 10 - 50 kV and 0.5 - 10 kV electron beam columns have been developed: `slicing,' and `stacking.' Two or three miniature columns could be used to perform a 20 nm or better alignment of an x-ray mask to a substrate. An array of miniature columns could be used for rapid wafer inspection and high throughput electron beam lithography. The column fabrication methods combine the precision of semiconductor processing and fiber optic technologies to create macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. The overall performance of the miniature column also depends on the emission characteristics of the micromachined electron source which is currently being investigated.

Paper Details

Date Published: 13 May 1994
PDF: 12 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175812
Show Author Affiliations
Alan D. Feinerman, Univ. of Illinois/Chicago (United States)
David A. Crewe, Univ. of Illinois/Chicago (United States)
Dung-Ching Perng, Univ. of Illinois/Chicago (United States)
Capp A. Spindt, SRI International (United States)
Paul R. Schwoebel, SRI International (United States)
Albert V. Crewe, Univ. of Chicago (United States)

Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

© SPIE. Terms of Use
Back to Top