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Proceedings Paper

Application and experimental verification of finite element modeling of friction effects for x-ray lithography mask mounts
Author(s): Hector T. H. Chen; Matthew E. Hansen; Roxann L. Engelstad; William A. Johnson
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Paper Abstract

In general, the application of finite element modeling to x-ray lithography mask distortions has assumed ideal conditions, i.e., frictionless mounts. Under actual conditions, friction can play a part in inducing both out-of-plane (OPD) and in-plane distortions (IPD) of the x-ray mask due to mounting or environmental conditions. This paper discusses the application of nonlinear three-dimensional interface elements to simulate friction in existing finite element (FEM) models of various masks and verifies the accuracy of the modeling with interferometric studies of both OPD and IPD for different mask configurations. Once the finite element models have been verified, the friction elements are then applied to a FEM model of the ARPA-NIST Mask Standard (with a kinematic mount) to determine the effects of friction on the IPD as a function of environmental temperature and clamping force. The results of this analysis show both the importance of designing ideal mounts (i.e., frictionless) as well as maintaining a fixed environmental temperature and controlling the clamping forces during the writing and exposure of x-ray lithography masks.

Paper Details

Date Published: 13 May 1994
PDF: 9 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175810
Show Author Affiliations
Hector T. H. Chen, Univ. of Wisconsin/Madison (United States)
Matthew E. Hansen, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
William A. Johnson, Motorola (United States)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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