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Proceedings Paper

Soft x-ray output from the spherical pinch plasma radiation source (SPX II) for microlithography applications
Author(s): Jiong Chen; Emilio Panarella; B. Hilko; Haibo Chen
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Paper Abstract

Study of soft x-ray (0.8 - 10 keV) output from the SPX II, a spherical pinched plasma radiation source, is presented. The soft x-ray output increases with the discharge voltage. The output is also a function of the gases used and pressures. A simple analytic model was developed which can scale the imploding wave velocity with respect to the discharge voltage and the gas density. Experiments to measure the imploding wavefronts were carried out. The predictions of the model agree well with the measured results in a wide range of the parameter space.

Paper Details

Date Published: 13 May 1994
PDF: 9 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175809
Show Author Affiliations
Jiong Chen, Advanced Laser and Fusion Technology, Inc. (Canada)
Emilio Panarella, Advanced Laser and Fusion Technology, Inc. (Canada)
B. Hilko, Advanced Laser and Fusion Technology, Inc. (Canada)
Haibo Chen, Advanced Laser and Fusion Technology, Inc. (Canada)


Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

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