Share Email Print

Proceedings Paper

Neon dense plasma focus point x-ray source for <=0.25 um lithography
Author(s): Rahul R. Prasad; Mahadevan Krishnan; Joseph Mangano; Philip A. Greene; Niansheng Qi
Format Member Price Non-Member Price
PDF $17.00 $21.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

A discharge driven, dense plasma focus (DPF) in Neon has been developed at SRL as a point x-ray source for sub-micron lithography. This source is presently capable of delivering approximately 25 J/pulse of Neon K-shell x rays (8 - 14 angstrom) into 4 (pi) steradians with an approximately equals 1.4% wall plug efficiency at a 20 Hz repetition rate. This corresponds to 500 W of average x-ray power. The discharge is produced by a capacitor bank circuit (8 kV, 1.8 kJ) that drives approximately equals 320 kA currents into the DPF load, with approximately equals 1 microsecond(s) rise-times. X rays are produced when a dense pinch of Neon is formed along the axis of the DPF electrodes. Four X ten5 discharges using a cooled DPF head have been fired producing x rays. The variation in the measured x-ray output, over several 104 shots, corresponds to a variation in the dose delivered to a resist 40 cm from the source, of less than 1%. Data showing the measurement of the x-ray output, size, dose delivered to a resist, spectra of the source output, novel beam line concepts, and potential lithographic applications are discussed.

Paper Details

Date Published: 13 May 1994
PDF: 9 pages
Proc. SPIE 2194, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV, (13 May 1994); doi: 10.1117/12.175797
Show Author Affiliations
Rahul R. Prasad, Science Research Lab. (United States)
Mahadevan Krishnan, Science Research Lab. (United States)
Joseph Mangano, Science Research Lab. (United States)
Philip A. Greene, Science Research Lab. (United States)
Niansheng Qi, Science Research Lab. (United States)

Published in SPIE Proceedings Vol. 2194:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV
David O. Patterson, Editor(s)

© SPIE. Terms of Use
Back to Top