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Proceedings Paper

Focusing and leveling system using position-sensitive detectors for the wafer steppers
Author(s): Dohoon Kim; Won-Ick Jang; Boo-Yeon Choi; Youngjik I. Lee; Jong-Hyun Lee; Hyung Joun Yoo; S. W. Kang; Jin Hyuk Kwon
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Paper Abstract

An optical focus and leveling system for ETRI KrF excimer laser stepper is developed using position sensitive detectors (PSD) and optical magnification method. This type of detection method showed focusing and leveling accuracies of about +/- 0.1 micrometers and +/- 1.0 arcsec (+/- 0.5 X 10-5 rad) respectively. Also, we confirmed experimentally the autofocus system has +/- 0.15 micrometers signal stability within the controlled temperature range of +/- 0.1 degree(s)C. In this paper, we report the design concepts of the focusing and leveling system and the characteristics of the system parameter applied to ETRI KrF excimer laser stepper.

Paper Details

Date Published: 17 May 1994
PDF: 7 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175492
Show Author Affiliations
Dohoon Kim, Electronics and Telecommunications Research Institute (South Korea)
Won-Ick Jang, Electronics and Telecommunications Research Institute (South Korea)
Boo-Yeon Choi, Electronics and Telecommunications Research Institute (South Korea)
Youngjik I. Lee, Electronics and Telecommunications Research Institute (South Korea)
Jong-Hyun Lee, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
S. W. Kang, Electronics and Telecommunications Research Institute (South Korea)
Jin Hyuk Kwon, Yeung Nam Univ. (South Korea)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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