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Proceedings Paper

Optimization of optical properties for single-layer halftone masks
Author(s): Shinichi Ito; Hiroaki Hazama; Takashi Kamo; Hideya Miyazaki; Hiroyuki Sato; Kenji Hayashi; Fumiaki Shigemitsu; Ichiro Mori
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Paper Abstract

An algorithm necessary to decide the optimum optical properties of a single-layer halftone (HT) mask has been established. This paper reveals the relations between the refractive index n and the extinction coefficient k, and thickness d, and describes how to select optimum films among various materials. It has been found that SiNx is a good material for a single-layer HT mask for I-line (365 nm) and KrF (248 nm). The lithographic performance of an I-line SiNx HT mask for grouped line and space (L&S) patterns under annular illumination has also been demonstrated.

Paper Details

Date Published: 17 May 1994
PDF: 12 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175486
Show Author Affiliations
Shinichi Ito, Toshiba Corp. (Japan)
Hiroaki Hazama, Toshiba Corp. (Japan)
Takashi Kamo, Toshiba Corp. (Japan)
Hideya Miyazaki, Toshiba Corp. (Japan)
Hiroyuki Sato, Toshiba Corp. (Japan)
Kenji Hayashi, Toshiba Corp. (Japan)
Fumiaki Shigemitsu, Toshiba Corp. (Japan)
Ichiro Mori, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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