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Proceedings Paper

High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography
Author(s): Alexander N. Novoselov; Boris A. Konstantinov; Victor G. Nikiforov; Boris F. Trinchuk
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Paper Abstract

First time the possibility to use unstable telescopic resonator with Fabry-Perot etalon as a selective spectral element in excimer KrF laser to reduce the beam divergence and narrow linewidth of laser radiation is demonstrated. The efficiency of the new resonator was demonstrated on serial laser 9J114-'94, and radiation with the following parameters was received — output energy 20 mJ, spectrum width 15 pm, energy divergence less or equal O.18x0.30 mrad. The spectral brightness of the laser radiation was increased more than for order of value in comparison with the use of a conventional selective flat resonator, and achieved 2.5 * io J/cm2 * sr * nm. Further improvement of laser characteristics due to optimization of proposed optical resonator scheme parameters is possible.

Paper Details

Date Published: 17 May 1994
PDF: 4 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175484
Show Author Affiliations
Alexander N. Novoselov, Scientific Research Institute ZENIT (Russia)
Boris A. Konstantinov, Scientific Research Institute ZENIT (Russia)
Victor G. Nikiforov, Scientific Research Institute ZENIT (Russia)
Boris F. Trinchuk, Scientific Research Institute ZENIT (Russia)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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