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Proceedings Paper

High-repetition-rate lasers for advanced DUV exposure tools
Author(s): Ulrich Rebhan; Rainer Paetzel; Hermann Buecher; Michael W. Powell
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Paper Abstract

KrF lasers with up to 500 Hz repetition rate and a bandwidth of about 1 pm are in use for DUV-microlithography. Increasing resist sensitivity demands even higher repetition rate in order to allow precise dose control. In some cases step & scan exposure tools apply reflective optics instead of refractive ones. This diminishes the bandwidth requirements by about two orders of magnitude, but a high polarization degree of >= 98% is a basic requirement for the laser light source. Dose control and statistics define the second basic requirement for the laser. A dose accuracy of less than 2% demands small energy increments, i.e., for pulse energy in the 10 to 20 mJ range. Throughput requires 10 to 20 W of average laser power. Therefore, the repetition rate must be in the 1 kHz range.

Paper Details

Date Published: 17 May 1994
PDF: 7 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175483
Show Author Affiliations
Ulrich Rebhan, Lambda Physik GmbH (Germany)
Rainer Paetzel, Lambda Physik GmbH (Germany)
Hermann Buecher, Lambda Physik GmbH (Germany)
Michael W. Powell, Lambda Physik GmbH (Germany)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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