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Proceedings Paper

Recent advances of a KrF excimer laser on a plant's practical requirements
Author(s): Yukio Kobayashi; Takanobu Ishihara; Hiroaki Nakarai; Noritoshi Ito; Tomokazu Takahashi; Osamu Wakabayashi; Hakaru Mizoguchi; Yoshiho Amada; Junichi Fujimoto; Masahiko Kowaka; Yasuhiro Nozue
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Paper Abstract

In this paper we describe the performance of the newest model of line-narrowed KrF excimer laser KLES-G6 (1995 model) developed in factory on the practical requirements. The KLES- G6 exhibits: (1) spectral bandwidth < 0.8 pm; (2) wavelength stability < +/- 0.1 pm; (3) pulse-to-pulse energy stability < 1.8% ((sigma) ); (4) output power equals 6 W at 600 Hz; (5) gas life > 100 million pulses or 7 days; (6) window cleaning or exchange > 1 billion pulses; (7) laser chamber exchange > 2 billion pulses; (8) mean time between failures > 1500 hours; (9) running cost per a billion pulses is about 29 thousand dollars. These advanced performances will save the running cost and guarantee the high uptime ratio needed to satisfy the plant's practical requirements.

Paper Details

Date Published: 17 May 1994
PDF: 12 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175482
Show Author Affiliations
Yukio Kobayashi, Komatsu Ltd. (Japan)
Takanobu Ishihara, Komatsu Ltd. (Japan)
Hiroaki Nakarai, Komatsu Ltd. (Japan)
Noritoshi Ito, Komatsu Ltd. (Japan)
Tomokazu Takahashi, Komatsu Ltd. (Japan)
Osamu Wakabayashi, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)
Yoshiho Amada, Komatsu Ltd. (Japan)
Junichi Fujimoto, Applied Komatsu Technology Inc. (Japan)
Masahiko Kowaka, Applied Komatsu Technology Inc. (Japan)
Yasuhiro Nozue, Applied Komatsu Technology Inc. (Japan)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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