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Proceedings Paper

Small-field projection imaging system for deep-UV development
Author(s): Richard F. Hollman; David J. Elliott
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Paper Abstract

This paper describes the design, operation, and performance of a small-field, step-and-repeat deep-UV projection exposure system for photoresist evaluation and advanced IC process research. Description of the basic sub-systems is given, including the 10X mirror-based projection optics, focus and dose control systems, and the control system user interface that facilitates photoresist characterization experiments. Imaging and characterization results are presented on promising 193 nm photoresist materials. Finally, future work on new resists and on a newly designed, high NA catadioptric lens (patent pending) for sub-quarter micron imaging are described.

Paper Details

Date Published: 17 May 1994
PDF: 6 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175479
Show Author Affiliations
Richard F. Hollman, Excimer Laser Systems, Inc. (United States)
David J. Elliott, Excimer Laser Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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