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Proceedings Paper

New phase-shifting method for high-resolution microlithography
Author(s): Motoi Kido; Gabor Szabo; Joseph R. Cavallaro; William L. Wilson Jr.; Frank K. Tittel
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Paper Abstract

This paper reports simulation and experimental details of a novel phase shifting technique based on interferometry. Phase shifting is one of the most promising techniques for future high density DRAM fabrication. Conventional phase shifting-masks, however, are difficult to fabricate as they require regions of different optical thickness. This new phase shifting technique does not require any phase shifting materials on the mask. A special interferometer and a mask that has both transmitting areas and reflective areas accomplish the required phase- shift at the image plane. Phase shifting effects are confirmed using both CCD camera analysis as well as photoresist response. The results of computer simulations of critical resolution and error tolerance for this new method as compared with the conventional phase shifting technique are also presented.

Paper Details

Date Published: 17 May 1994
PDF: 9 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175474
Show Author Affiliations
Motoi Kido, Rice Univ. (United States)
Gabor Szabo, Jate Univ. (Hungary)
Joseph R. Cavallaro, Rice Univ. (United States)
William L. Wilson Jr., Rice Univ. (United States)
Frank K. Tittel, Rice Univ. (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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