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Proceedings Paper

Near-field nanofabrication with pipette-guided ArF excimer laser
Author(s): Michael Rudman; Anatoly Shchemelinin; Klony S. Lieberman; Aaron Lewis
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Paper Abstract

A number of distance control methods have been developed that allow the direct ablation capabilities of the ArF excimer laser to be applied to near-field optical methods of nanopatterning. Feedback systems based on evanescent field detection, capacitance, and lateral atomic force sensing have been incorporated into our near-field optical nanofabrication system. Using these control techniques, structures were directly patterned on a variety of substrates with dimension on the order of 100 nm. These feedback techniques are versatile enough to allow accurate distance control despite severe disturbances to the system caused by high energy excimer laser pulses.

Paper Details

Date Published: 17 May 1994
PDF: 9 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175473
Show Author Affiliations
Michael Rudman, Hebrew Univ. of Jerusalem (Israel)
Anatoly Shchemelinin, Hebrew Univ. of Jerusalem (Israel)
Klony S. Lieberman, Hebrew Univ. of Jerusalem (Israel)
Aaron Lewis, Hebrew Univ. of Jerusalem (Israel)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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