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Proceedings Paper

Wide-field variable NA lens analysis for high-volume 0.5-um manufacturing
Author(s): Paul W. Ackmann; Stuart E. Brown; Richard D. Edwards
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Paper Abstract

Several techniques were used to evaluate and compare various lenses: optical, SEM, and electrical. In this paper, the emphasis is on `usable' critical dimensions and the effects of the lens on CD control. Lens results were examined at multiple numerical apertures (NAs) and partial coherence settings (PC) using a CD reticle with electrical CD structures over seventeen sites per field. The results were analyzed by electrical methods and a scanning electron microscope (SEM) with CD capability. The influence of external factors was minimized through the use of the same resist/developer batch at all testing locations. We selected electrical and SEM measurement methods for 0.40, 0.45, 0.50 micron structures and compared depth-of-focus, exposure latitude, CD linearity, and isolated vs. dense line/space pairs. Preliminary results show the benefits of electrical testing for increased confidence over the full lens field because of increased sample size. The optical method provided a quick and centered capability and matched electrical results closely. This testing methodology allowed AMD to evaluate lens performance of multiple systems and compare performance equally.

Paper Details

Date Published: 17 May 1994
PDF: 18 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175462
Show Author Affiliations
Paul W. Ackmann, Advanced Micro Devices, Inc. (United States)
Stuart E. Brown, Advanced Micro Devices, Inc. (United States)
Richard D. Edwards, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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