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Proceedings Paper

Programming of phase-shift mask simulation software and some important aspects
Author(s): Long Que; Guoliang Sun; Feng Boru
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Paper Abstract

In the paper we report some work on the programming of phase shift mask (PSM) simulation software, some important parameters are analyzed, in the meantime, we set up the mathematical models for studying rounding characteristics of imaging of the bar patterns under the project lithography system with incoherent, partial coherent, coherent illumination, and theoretical results compared to the experimental results.

Paper Details

Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175445
Show Author Affiliations
Long Que, Institute of Optics and Electronics (China)
Guoliang Sun, Institute of Optics and Electronics (China)
Feng Boru, Institute of Optics and Electronics (China)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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