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Proceedings Paper

Using behavior modeling for proximity correction
Author(s): Michael L. Rieger; John P. Stirniman
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Paper Abstract

A proximity correction system supporting zone-sampling behavior modeling (see SPIE 2197- 28, `Fast proximity correction with zone sampling,') is described. The data flow for correcting integrated circuit layout patterns is explained. We outline the steps needed to generate and optimize behavior models, that serve as correction `rules.'

Paper Details

Date Published: 17 May 1994
PDF: 6 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175431
Show Author Affiliations
Michael L. Rieger, Precim Co. (United States)
John P. Stirniman, Precim Co. (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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