Share Email Print
cover

Proceedings Paper

Effects of transparent and transmission reduction reticle defects
Author(s): Larry S. Zurbrick; Steven J. Schuda; James N. Wiley
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Transparent and transmission defects were studied by performing wafer printability studies. An Orion test reticle was fabricated with programmed thin resist artifacts on a conventional binary reticle to simulate transparent defects. The transparent defects on the Orion reticle printed larger than equivalent design size programmed chrome defects. Programmed transmission defects were created on contact geometry by selectively depositing thin layers of chromium over contacts on the reticle. The effect on wafer focus/exposure curves of contact transmission defects was studied.

Paper Details

Date Published: 17 May 1994
PDF: 12 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175417
Show Author Affiliations
Larry S. Zurbrick, KLA Instruments Corp. (United States)
Steven J. Schuda, KLA Instruments Corp. (United States)
James N. Wiley, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

© SPIE. Terms of Use
Back to Top