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Proceedings Paper

Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings
Author(s): Yong-Ho Oh; Byung-Sun Park; Hai Bin Chung; Sang-Soo Choi; Seong-Hak Choi; Hyung Joun Yoo; Sin-Chong Park
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Paper Abstract

Some solutions are suggested for problems in the application of the dummy diffraction mask with the L/S phases grating. The degradation of the isolated pattern resolution can be successfully improved by the sub-resolution type design and the orientation dependency is attended by the zone by zone optimization technique with reduced gap size (approximately 200 micrometers ) between the main and dummy layers.

Paper Details

Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175415
Show Author Affiliations
Yong-Ho Oh, Electronics and Telecommunications Research Institute (South Korea)
Byung-Sun Park, Electronics and Telecommunications Research Institute (South Korea)
Hai Bin Chung, Electronics and Telecommunications Research Institute (South Korea)
Sang-Soo Choi, Electronics and Telecommunications Research Institute (South Korea)
Seong-Hak Choi, Electronics and Telecommunications Research Institute (South Korea)
Hyung Joun Yoo, Electronics and Telecommunications Research Institute (South Korea)
Sin-Chong Park, Electronics and Telecommunications Research Institute (South Korea)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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