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Proceedings Paper

Techniques for improving overlay on multilayer phase-shift masks
Author(s): Henry Chris Hamaker; Michael J. Bohan; Peter D. Buck; Claudia H. Geller; Takashi Makiyama; Francis P. Mathew; William S. Neeland
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Paper Abstract

Techniques used to optimize the alignment performance of the CORE-2564PSM reticle writer are presented. In particular, unique procedures for accurately locating alignment marks with nonuniform background intensities are discussed. Site-by-site automatic illumination control is implemented to ensure optimal image intensity and contrast for the CCD-based image capture system. Process and metrology considerations that affect error measurement are discussed. The mean + range/2 aligned overlay of the CORE-2564PSM is shown to be 35 - 55 nm.

Paper Details

Date Published: 17 May 1994
PDF: 12 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175411
Show Author Affiliations
Henry Chris Hamaker, Etec Systems Inc. (United States)
Michael J. Bohan, Etec Systems Inc. (United States)
Peter D. Buck, Etec Systems Inc. (United States)
Claudia H. Geller, Etec Systems Inc. (United States)
Takashi Makiyama, Etec Systems Inc. (United States)
Francis P. Mathew, Etec Systems Inc. (United States)
William S. Neeland, Etec Systems Inc. (United States)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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