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Proceedings Paper

Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method
Author(s): Mitsunori Nakatani; Hiroshi Matsuoka; Hirofumi Nakano; Kazuya Kamon; Kazuhiko Sato; Osamu Ishihara; Shigeru Mitsui
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Paper Abstract

Origin of asymmetrical resist patterns, which had been observed in the edge-line phase shift lithography, has been investigated by simulations and experiments concerning the affects of shifter edge angle and stepper lens aberration. It has been found that the asymmetry of resist patterns has been caused by coma aberration of stepper projection lens and enhanced as the shifter width becomes narrower. Furthermore, the effect of shifter edge angle has been proved equivalent to the effect of narrowing the shifter width.

Paper Details

Date Published: 17 May 1994
PDF: 11 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175410
Show Author Affiliations
Mitsunori Nakatani, Mitsubishi Electric Corp. (Japan)
Hiroshi Matsuoka, Mitsubishi Electric Corp. (Japan)
Hirofumi Nakano, Mitsubishi Electric Corp. (Japan)
Kazuya Kamon, Mitsubishi Electric Corp. (Japan)
Kazuhiko Sato, Mitsubishi Electric Corp. (Japan)
Osamu Ishihara, Mitsubishi Electric Corp. (Japan)
Shigeru Mitsui, Mitsubishi Electric Corp. (Japan)

Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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