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Proceedings Paper

Overcoming global topography and improving lithographic performance using a transmittance controlled mask
Author(s): Woo-Sung Han; Chang-Jin Sohn; Hoyoung Kang; Young-Bum Koh; Moon-Yong Lee
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Paper Abstract

As device density increases, topography gets more severe and optical proximity effect becomes worse. If light intensity can be controlled for individual patterns, linewidth variation over topography and optical proximity effect can also be minimized. A new method to solve these problems named transmittance controlled mask (TCM) is proposed. TCM is such a mask that thin absorptive films remain on the areas where light attenuation is necessary. In this paper, TCM is prepared and evaluated in view of topography and optical proximity effect improvement as well as process latitude improvement. Greatly improved process latitude was observed over 1.5 micrometers aluminum topography with TCM, while no process latitude was obtained with conventional masks even over 0.9 micrometers topography. Good optical proximity control is also possible with TCM.

Paper Details

Date Published: 17 May 1994
PDF: 10 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175408
Show Author Affiliations
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Chang-Jin Sohn, Samsung Electronics Co., Ltd. (South Korea)
Hoyoung Kang, Samsung Electronics Co., Ltd. (South Korea)
Young-Bum Koh, Samsung Electronics Co., Ltd. (South Korea)
Moon-Yong Lee, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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