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Proceedings Paper

Phase-shifter edge effects on attenuated phase-shifting mask image quality
Author(s): Alfred K. K. Wong; Richard A. Ferguson; Andrew R. Neureuther
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Paper Abstract

Edge effects of space, line, and linespace patterns in attenuated phase-shifting masks are studied using experimentally measured aerial images from the IBM AIMS tool, the scalar and thin mask approximations in SPLAT, and the rigorous electromagnetic simulator TEMPEST. The inadequacy of the thin mask approximation cannot be anticipated from comparisons of in- focus images of isolated line features as the experimentally measured image and the predictions from SPLAT and TEMPEST agree well. However, the scalar and thin mask approximations are not suitable for out of focus image prediction for all pattern types because the presence of the glass edges causes a focus shift of about 0.1 micrometers . Printing small isolated spaces and dense linespace patterns is more robust than isolated lines in the attenuated PSM technology.

Paper Details

Date Published: 17 May 1994
PDF: 8 pages
Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); doi: 10.1117/12.175406
Show Author Affiliations
Alfred K. K. Wong, Univ. of California/Berkeley (United States)
Richard A. Ferguson, IBM Microelectronics (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 2197:
Optical/Laser Microlithography VII
Timothy A. Brunner, Editor(s)

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