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Proceedings Paper

Relationship between physical properties and lithographic behavior in a high-resolution positive tone deep-UV resist
Author(s): Ulrich P. Schaedeli; Norbert Muenzel; Heinz E. Holzwarth; Sydney G. Slater; Omkaram Nalamasu
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Paper Abstract

A chemically amplified positive tone resist system, based on new maleimide polymers and a photoacid generator, has been developed, called MISTRAL (Maleimide-Styrene based Resist for Advanced Lithography). These polymers, which are insoluble in aqueous base, consist of two different types of monomers: blocked p- hydroxystyrenes and N-substituted maleimides. In the irradiated zones of the resist film, the phenols are regenerated by the presence of a photoacid, thereby making the resist soluble in an appropriate developer. The maleimides, on the other hand, are needed to introduce high thermal stability and good film properties. The maleimides can further be used to tailor the dissolution properties of the resist. A variety of different MISTRAL polymers have been prepared, starting from the corresponding monomers. Changes in the molecular weight, the types of monomers used and their ratio in the feed have been analyzed: a correlation study between the physical properties of the MISTRAL polymers and their lithographic behavior was systematically performed, revealing quarter micron resolution capabilities.

Paper Details

Date Published: 16 May 1994
PDF: 13 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175403
Show Author Affiliations
Ulrich P. Schaedeli, Ciba-Geigy Inc. (Switzerland)
Norbert Muenzel, OCG Microelectronic Materials AG (Switzerland)
Heinz E. Holzwarth, OCG Microelectronic Materials AG (Switzerland)
Sydney G. Slater, OCG Microelectronic Materials, Inc. (United States)
Omkaram Nalamasu, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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