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Proceedings Paper

Effects of deprotected species on chemically amplified resist systems
Author(s): Toshiyuki Ota; Yoji Ikezaki; Toru Kajita; Eiichi Kobayashi; Akira Tsuji
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Paper Abstract

We studied the deprotecting chemistry of poly(4-hydroxystyrene) based positive-working CA resist systems by using model reactions. Detailed analyses of acid-catalyzed deprotecting reactions of TMS-, THP-, and t-BOC-protected p-cresols were carried out, and it was found that alkylated derivatives of p- cresol were formed as major products for THP- and t-BOC-protected p-cresol, while no alkylated products were obtained for TMS derivatives after deprotection treatment (90 degree(s)C, 2 min). In the THP- and t-BOC-protected PHS systems were also observed such alkylations, which decreased the alkaline dissolution rate of the polymer film. The alkylations are considered to lower the alkaline dissolution contrast between an exposed area and an unexposed area in a resist film, and to deteriorate the resist performance. Therefore, we propose to introduce an alkylation inhibitor to the resist components so as to improve the performance.

Paper Details

Date Published: 16 May 1994
PDF: 10 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175401
Show Author Affiliations
Toshiyuki Ota, Japan Synthetic Rubber Co., Ltd. (Japan)
Yoji Ikezaki, Japan Synthetic Rubber Co., Ltd. (Japan)
Toru Kajita, Japan Synthetic Rubber Co., Ltd. (Japan)
Eiichi Kobayashi, Japan Synthetic Rubber Co., Ltd. (Japan)
Akira Tsuji, Japan Synthetic Rubber Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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