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Proceedings Paper

Novel synthetic aqueous photoresist for CCD micro color filter
Author(s): Koji Shimomura; Tomoko Otagaki; Yoko Tamagawa; Michiyo Kobayashi; Hiromitsu Aoki; Yoshikazu Sano; Sumio Terakawa
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Paper Abstract

A novel synthetic aqueous photoresist has been developed for CCD micro color filters. The resist consists of four-components methacrylate copolymers as a resin and diazo compound as a photosensitizer. The resist uses water as a solvent and a developer. The performance characteristics of this resist are the sensitivity of less than 100 mJ/cm2, the contrast of more than 8 ((gamma) value), the resolution of less than 1.5 micrometers lines and spaces, the thermal stability of 250 degree(s)C (the transmittance of more than 90% at visual wavelength) and the shelf life of more than 10 days at 23 degree(s)C. It is easily dyed and dyefixed. Micro color filters for 1/4 inch CCD successfully fabricated by using this resist.

Paper Details

Date Published: 16 May 1994
PDF: 11 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175395
Show Author Affiliations
Koji Shimomura, Matsushita Electronics Corp. (Japan)
Tomoko Otagaki, Matsushita Electronics Corp. (Japan)
Yoko Tamagawa, Matsushita Electronics Corp. (Japan)
Michiyo Kobayashi, Matsushita Electronics Corp. (Japan)
Hiromitsu Aoki, Matsushita Electronics Corp. (Japan)
Yoshikazu Sano, Matsushita Electronics Corp. (Japan)
Sumio Terakawa, Matsushita Electronics Corp. (Japan)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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