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Proceedings Paper

Structure-property relationship in acetal-based chemically amplified three-component DUV resist
Author(s): Munirathna Padmanaban; Yoshiaki Kinoshita; Takanori Kudo; Thomas J. Lynch; Seiya Masuda; Yuko Nozaki; Hiroshi Okazaki; Georg Pawlowski; Klaus Juergen Przybilla; Horst Roeschert; Walter Spiess; Natusmi Suehiro; Horst Wengenroth
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Paper Abstract

AZ DX series are chemically amplified, three component resists based on a poly(4-hydroxystyrene-co-3-methyl-4-hydroxystyrene) matrix resin, a poly(N,O-acetal) dissolution inhibitor, and a bis(arylsulfonyl)diazomethane acid generator. The previously described AZ DX 46 is an environmentally and delay time stable, high performance resist capable of lineating structures down to 0.23 micrometers . The material contains a photoactive base to reduce the delay time effects. In this paper the influence of styrene units in the matrix resin, and some new polyacetals on the performance of the resist in comparison to the above mentioned standard formulation AZ DX 46.

Paper Details

Date Published: 16 May 1994
PDF: 13 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175392
Show Author Affiliations
Munirathna Padmanaban, Hoechst Japan Ltd. (Japan)
Yoshiaki Kinoshita, Hoechst Japan Ltd. (Japan)
Takanori Kudo, Hoechst Japan Ltd. (Japan)
Thomas J. Lynch, Hoechst Celanese Corp. (United States)
Seiya Masuda, Hoechst Japan Ltd. (Japan)
Yuko Nozaki, Hoechst Japan Ltd. (Japan)
Hiroshi Okazaki, Hoechst Japan Ltd. (Japan)
Georg Pawlowski, Hoechst AG (Germany)
Klaus Juergen Przybilla, Hoechst AG (Germany)
Horst Roeschert, Hoechst AG (Germany)
Walter Spiess, Hoechst AG (Germany)
Natusmi Suehiro, Hoechst Japan Ltd. (Japan)
Horst Wengenroth, Hoechst AG (Germany)


Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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