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Proceedings Paper

Correlation between the sensitivity and the contrast of polymer resists for developing in good and bad solvents
Author(s): Vladimir N. Genkin; M. Yu. Myl'nikov
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Paper Abstract

The development processes in microlithography consist in removing of exposure region with rate V exceeding the dissolution rate of unexposed regions. The technology characteristics of the resists are the contrast, the sensitivity and the resolution. These characteristics depend on the resist response to the irritation and on the development conditions. We want to devote this work to the analysis of correlation between the resolution, the contrast, the sensitivity determined by the indicated method and the exposure dose for homogeneous irradiation.

Paper Details

Date Published: 16 May 1994
PDF: 3 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175387
Show Author Affiliations
Vladimir N. Genkin, Institute of Applied Physics/Russian Academy of Sciences (Russia)
M. Yu. Myl'nikov, Institute of Applied Physics/Russian Academy of Sciences (Russia)


Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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