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Proceedings Paper

Comparison of photoresist shelf life in PGMEA and CA solvent systems
Author(s): William C. Nelson
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Paper Abstract

Use of safer photoresist solvents such as propylene glycol monomethyl ether acetate (PGMEA, PMA) has been steadily increasing as a positive photoresist casting solvent. This work compares the aging characteristics and shelf life of photoresist prepared with PGMEA versus cellosolve acetate (CA, 2-ethoxyethyl acetate). By comparing samples stored at elevated temperatures with those at room temperature, aging rates are evaluated on photosensitivity, contrast, thickness and absorbance. Using first order reaction kinetic assumptions, these aging rates are compared to product specification limits to estimate shelf life.

Paper Details

Date Published: 16 May 1994
PDF: 8 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175385
Show Author Affiliations
William C. Nelson, Hoechst Celanese Corp. (United States)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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