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Proceedings Paper

Influence of retained and absorbed solvent on novolak and resist film dissolution and thermal behavior
Author(s): Bernard T. Beauchemin; Charles E. Ebersole; Ivan S. Daraktchiev
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Paper Abstract

Solvent evaporation from Novolak solution was characterized by TGA and occurs in two distinct stages of solvent loss: an evaporation limiting state (solvent determined) and a diffusion limiting stage (polymer determined) and is used to understand solvent retention mechanism during spin coating. Retained solvent content in Novolak films, as determined by gas chromatography and FT-IR Spectrometry, is found to reduce the apparent Tg and increase the bulk dissolution rate of the novolak. Solvent distribution in the film, monitored as a function of depth by a reflectance FT-IR technique, is used to develop a Novolak dissolution model which characterizes both surface induction and bulk dissolution behavior.

Paper Details

Date Published: 16 May 1994
PDF: 14 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175374
Show Author Affiliations
Bernard T. Beauchemin, OCG Microelectronic Materials, Inc. (United States)
Charles E. Ebersole, OCG Microelectronic Materials, Inc. (United States)
Ivan S. Daraktchiev, OCG Microelectronic Materials NV (Belgium)


Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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