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Proceedings Paper

Dissolution behavior of the chemically modified polyvinylphenol with introduced high-ortho structure
Author(s): Kenji Honda; Sydney G. Slater; Bernard T. Beauchemin; Medhat A. Toukhy; Sobhy P. Tadros; Toshiaki Aoai; Yasumasa Kawabe
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Paper Abstract

Poly (p-vinylphenol) was derivatized by reaction with ortho- methylolated precursors to introduce ortho-ortho linked phenolic diad and triad moieties onto the polyethylene backbone. In particular, the resulting polymers obtained by the reaction with 2,4-dimethyl-6-methylolphenol were characterized by spectroscopic and lithographic methods to understand the structure/property relationship. The reaction took place in a sequential fashion so that the diad formation was followed by the triad formation. The diad was found to have two conformations, corresponding to hydrogen-bonded and -unbonded states, while the triad existed only in the hydrogen-bonded conformation. The dissolution behavior of the modified polymers with and without DNQ ester was greatly affected by the degree of HMX incorporation. Optimized resist performance determined by dissolution rate monitoring was obtained on modification of all phenolic moieties with a diad/triad ratio of approximately 1.

Paper Details

Date Published: 16 May 1994
PDF: 18 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175367
Show Author Affiliations
Kenji Honda, OCG Microelectronic Materials, Inc. (United States)
Sydney G. Slater, OCG Microelectronic Materials, Inc. (United States)
Bernard T. Beauchemin, OCG Microelectronic Materials, Inc. (United States)
Medhat A. Toukhy, OCG Microelectronic Materials, Inc. (United States)
Sobhy P. Tadros, OCG Microelectronic Materials, Inc. (United States)
Toshiaki Aoai, Fuji Photo Film Co., Ltd. (Japan)
Yasumasa Kawabe, Fuji Photo Film Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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