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Proceedings Paper

Photochemical amplified PMMA resists
Author(s): Vladimir N. Genkin
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Paper Abstract

The chemical amplified resists are a good way of the solution of the X-ray, e-beam and DUV resist sensitivity problem. The difficulties of this way are connected with a high temperature diffusion during the process of the chemical amplification [1] (decrease of the contrast) and with the problem of the stable realization of complex thin resist film compositions. The application of photo chemical reactions produces new opportunities to solve this problem [2-4] combined with the traditional methods of the existing technology.The photo chemical amplification of a latent image improving both the resist sensitivity and the contrast is discussed in this report.

Paper Details

Date Published: 16 May 1994
PDF: 7 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175351
Show Author Affiliations
Vladimir N. Genkin, Institute of Applied Physics/Russian Academy of Sciences (Russia)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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