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Proceedings Paper

Properties and performance of near-UV reflectivity control layers (RCL)
Author(s): Thomas J. Lynch; Valerie R. Paradis; Mark A. Spak; Wayne M. Moreau
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Paper Abstract

To overcome the limitations of two-component formulations, we have synthesized polymeric dyes which offer no or low bake processing and have suitable I line absorbance in films less than 100 nm thick. The polymeric RCL films are synthesized from absorbing dyes which are grafted onto polymers which are insoluble in the resist casting solvents. We have utilized amine dyes which are imidized onto polymeric backbones by a one step synthesis. The peak absorbance of the grafted dye after imidization undergoes a blue shift of about 30 nm and thus appropriate H line dyes are used to achieve I line peak absorbance.

Paper Details

Date Published: 16 May 1994
PDF: 11 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175340
Show Author Affiliations
Thomas J. Lynch, Hoechst Celanese Corp. (United States)
Valerie R. Paradis, Hoechst Celanese Corp. (United States)
Mark A. Spak, Hoechst Celanese Corp. (United States)
Wayne M. Moreau, IBM Corp. (United States)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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