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Proceedings Paper

Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters
Author(s): Marcia L. Schilling; Howard Edan Katz; Francis M. Houlihan; Janet M. Kometani; Susan M. Stein; Omkaram Nalamasu
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Paper Abstract

A new class of photodefinable polymers based on phosphonic acid esters has been developed. Photogenerated acid catalysts convert the esters to phosphonic acids in the exposed regions of films during post-exposure bake. Those phosphonic acids, in addition to providing the base-solubility necessary for positive-tone development, are also uniquely capable of binding metal ions and cations from solution. Preliminary lithographic evaluations indicate that these polymers generally show high contrast (approximately 10), good sensitivity, low volume loss (< 15 percent) and the potential for submicron resolution. More importantly, the patterned deposition of refractory metal ions has also been demonstrated which could be useful for at-the- surface imaging and circuit fabrication applications.

Paper Details

Date Published: 16 May 1994
PDF: 12 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175335
Show Author Affiliations
Marcia L. Schilling, AT&T Bell Labs. (United States)
Howard Edan Katz, AT&T Bell Labs. (United States)
Francis M. Houlihan, AT&T Bell Labs. (United States)
Janet M. Kometani, AT&T Bell Labs. (United States)
Susan M. Stein, AT&T Bell Labs. (United States)
Omkaram Nalamasu, AT&T Bell Labs. (United States)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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