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Proceedings Paper

Structural design of acid-decomposable dissolution inhibitors for a 3-components positive CA resist
Author(s): Toshiaki Aoai; Tsukasa Yamanaka; Tadayoshi Kokubo
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Paper Abstract

A design of a 3-components positive chemical amplification (CA) resist system was investigated. A series of model inhibitors were newly synthesized and examined for the structural influence to their inhibition efficiency on novolac (NVK) dissolution. The hydrophobicity and the molecular size of the inhibitor as well as the dispersivity of the acid decomposable groups in the molecule were found influential. By maximizing those parameters, the inhibitor with improved inhibition by three orders of magnitude compared to the previously known ones was obtainable. This even enabled a use of poly(p-hydroxystyrene) (PHS) as a binder, generally known to suffer from poor inhibition, in place of NVK. A molecular conformational analysis as well as IR spectrum analysis was carried out on the key materials for discussing the inhibition mechanism. A molecular interaction model between the inhibitor and the hydrophilic site of binder, a similar model to DNQ-PAC/NVK system, was proposed for the mechanism. The 3- components resist samples formulated with simple phenolic binders and the improved inhibitor performed well on imaging under KrF excimer laser exposure. A 0.24 micrometers L/S image with vertical profile was obtainable.

Paper Details

Date Published: 16 May 1994
PDF: 15 pages
Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); doi: 10.1117/12.175329
Show Author Affiliations
Toshiaki Aoai, Fuji Photo Film Co., Ltd. (Japan)
Tsukasa Yamanaka, Fuji Photo Film Co., Ltd. (Japan)
Tadayoshi Kokubo, Fuji Photo Film Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2195:
Advances in Resist Technology and Processing XI
Omkaram Nalamasu, Editor(s)

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