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Proceedings Paper

Fabrication and characteristics of rf magnetron-sputtered ITO thin films
Author(s): Wen-Fa Wu; Bi-Shiou Chiou
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Paper Abstract

Indium tin oxide (ITO) films have been deposited onto glass substrates by rf magnetron sputtering without in-situ substrate heating. The as-deposited films have an electrical resistivity of approximately 5 X 10-4 (Omega) -cm, visible transmittance of about 85%, and IR reflectance of above 80% at 5 micrometers . The effect of sputtering parameters on the deposition rate and the electrical and optical properties of ITO films are investigated. Loss of transmittance or blackening for ITO films prepared at high sputtering power are observed and explored.

Paper Details

Date Published: 2 May 1994
PDF: 7 pages
Proc. SPIE 2150, Design, Simulation, and Fabrication of Optoelectronic Devices and Circuits, (2 May 1994); doi: 10.1117/12.175003
Show Author Affiliations
Wen-Fa Wu, National Chiao Tung Univ. (Taiwan)
Bi-Shiou Chiou, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 2150:
Design, Simulation, and Fabrication of Optoelectronic Devices and Circuits
Mario Nicola Armenise, Editor(s)

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