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Proceedings Paper

Vacuum-arc plasma deposition: macroparticle filtering, scaling, and other problems
Author(s): Andre Anders; Simone Anders; Ian G. Brown; Robert A. MacGill; Michael R. Dickinson
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Paper Abstract

Micron-size macroparticles can be removed from vacuum arc plasmas using magnetic filters, permitting the deposition of high-quality thin films of the cathode material. The principle of magnetic filtering is explained, and ways of improving filter efficiency using additional electric and magnetic fields are explored. Under optimum conditions, about 25% of all ions entering the filter can be used for deposition. Other problems such as down or upscaling of deposition facilities are briefly discussed.

Paper Details

Date Published: 1 May 1994
PDF: 4 pages
Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); doi: 10.1117/12.174640
Show Author Affiliations
Andre Anders, Lawrence Berkeley Lab. (United States)
Simone Anders, Lawrence Berkeley Lab. (United States)
Ian G. Brown, Lawrence Berkeley Lab. (United States)
Robert A. MacGill, Lawrence Berkeley Lab. (United States)
Michael R. Dickinson, Lawrence Berkeley Lab. (United States)

Published in SPIE Proceedings Vol. 2259:
XVI International Symposium on Discharges and Electrical Insulation in Vacuum
Gennady A. Mesyats, Editor(s)

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