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Proceedings Paper

Sheath model of negatively biased substrate in vacuum arcs with cathode spots
Author(s): Zhongyuan Cheng; Jiyan Zou
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Paper Abstract

Plasma sheath near the substrate plays an important role in Vacuum Arc Deposition Technology (VADT). To analyze the sheath characteristics of the substrate in VADT, the unique ejection pattern of the cathode region must be taken into account. This paper describes a steady-state, two-dimension sheath model in which ions distribute specially according to a cosinoidal law. The model equations can be numerical soluted under specified conditions, to describe the sheath behavior of the substrate in the process of titanium film deposition using VADT. The model can be used for calculation of ion flux and heat flux flowing to the substrate in VADT, or in some other cases in which biased conductors were in vacuum arcs with cathode spots.

Paper Details

Date Published: 1 May 1994
PDF: 5 pages
Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); doi: 10.1117/12.174620
Show Author Affiliations
Zhongyuan Cheng, Huazhong Univ. of Science and Technology (China)
Jiyan Zou, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 2259:
XVI International Symposium on Discharges and Electrical Insulation in Vacuum

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