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Proceedings Paper

Filtered vacuum arc deposition of semiconductor thin films
Author(s): Raymond Boxman; Samuel Goldsmith; Amir Ben-Shalom; Larissa Kaplan; David Arbilly; Evgeny Gidalevich; Vladimir Zhitomirsky; Amiel Ishaya; Michael Keidar; Isak Beilis
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Paper Abstract

The cathode spot vacuum produces a jet of highly ionized plasma plus a spray of liquid droplets, both consisting of cathode material. The droplets are filtered from the plasma by passing the plasma through a curved, magnetic duct. A radial magnetic field may be applied to the face of the cathode to rotate and distribute the cathode spots in order to obtain even erosion and avoid local overheating.

Paper Details

Date Published: 1 May 1994
PDF: 6 pages
Proc. SPIE 2259, XVI International Symposium on Discharges and Electrical Insulation in Vacuum, (1 May 1994); doi: 10.1117/12.174615
Show Author Affiliations
Raymond Boxman, Tel Aviv Univ. (Israel)
Samuel Goldsmith, Tel Aviv Univ. (Israel)
Amir Ben-Shalom, Tel Aviv Univ. (Israel)
Larissa Kaplan, Tel Aviv Univ. (Israel)
David Arbilly, Tel Aviv Univ. (Israel)
Evgeny Gidalevich, Tel Aviv Univ. (Israel)
Vladimir Zhitomirsky, Tel Aviv Univ. (Israel)
Amiel Ishaya, Tel Aviv Univ. (Israel)
Michael Keidar, Tel Aviv Univ. (Israel)
Isak Beilis, Tel Aviv Univ. (Israel)


Published in SPIE Proceedings Vol. 2259:
XVI International Symposium on Discharges and Electrical Insulation in Vacuum
Gennady A. Mesyats, Editor(s)

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