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Proceedings Paper

Algorithm for submicron optical metrology optimization with combined illumination techniques
Author(s): Mircea V. Dusa; Guoqing Xiao; Erik H. Rauch; Joseph C. Pellegrini
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Paper Abstract

Our goal for the CD metrology process is to understand the influence of defocus and illumination latitude upon measured CDs and to optimize the focus and illumination settings for smallest measured CD range. For consistent submicron optical metrology process, the measured CD range should be better than +/- 10 nm (6S). The defocus and illumination latitudes are generated when the features are measured through focus at different illuminations. The process step is the factor that sets the conditions for different illumination modes. Traditional illumination modes in mask metrology are transmitted and reflected. The confocal reflected illumination mode adds a new dimension to the standard reflected light because of the increase in both transversal and longitudinal resolutions. The combined illumination between transmitted and reflected confocal modes proposed here, provide increased feature edge gradient and decreased intensity background noise. To emphasize the effects of the illumination modes, an algorithm is developed for CD metrology optimization using traditional and combined illumination techniques.

Paper Details

Date Published: 1 May 1994
PDF: 10 pages
Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174153
Show Author Affiliations
Mircea V. Dusa, Technical Instrument Co. (United States)
Guoqing Xiao, Technical Instrument Co. (United States)
Erik H. Rauch, Technical Instrument Co. (United States)
Joseph C. Pellegrini, New Vision Systems Inc. (United States)

Published in SPIE Proceedings Vol. 2196:
Integrated Circuit Metrology, Inspection, and Process Control VIII
Marylyn Hoy Bennett, Editor(s)

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