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Proceedings Paper

Comprehensive detection of defects on reduction reticles
Author(s): James N. Wiley
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Paper Abstract

As understanding of the effects of defects on reduction reticles advances, the desire for automatic detection of all classes of defects is created. The comprehensive detection of defects on reduction reticles is the ability to detect and classify defects that have not previously been associated with the defect inspection task. Test reticles have been fabricated with defects of these types and used to characterize inspection systems. Inspection characterization results show that a modified inspection system using simultaneous transmitted and reflected light inspection allows the detection of contamination on chrome and glass surfaces. Using an unmodified inspection system with standard defect detection algorithms, critical dimension errors due to e-beam lithography system butting errors were detected for errors smaller than 0.20 micrometers . Using an enhanced defect detection algorithm, transmission errors greater than -10% on contact geometry were detected.

Paper Details

Date Published: 1 May 1994
PDF: 15 pages
Proc. SPIE 2196, Integrated Circuit Metrology, Inspection, and Process Control VIII, (1 May 1994); doi: 10.1117/12.174152
Show Author Affiliations
James N. Wiley, KLA Instruments Corp. (United States)


Published in SPIE Proceedings Vol. 2196:
Integrated Circuit Metrology, Inspection, and Process Control VIII
Marylyn Hoy Bennett, Editor(s)

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